Relax¶
Reference
- Mode
Edit Mode
- Tool
The Relax brush makes UVs more evenly distributed. The algorithm relies on space, not stretch minimization, so most probably a minimize stretch will have to be run for optimal results. However it is great to use after stitching islands, or when unwrap produces cluttered results to smooth the distribution of UVs.
- Relaxation Method
There are two relax algorithms:
Laplacian, HC
Tool Settings¶
Brushes¶
- Brushes
The Data-Block Menu to select a preset brush type or a custom brush.
Brush Settings¶
- Radius
This option controls the radius of the brush, measured in pixels. F allows you to change the brush size interactively by dragging the mouse and then LMB. Typing a number then enter while using F allows you to enter the size numerically.
- Size Pressure
Brush size can be affected by enabling the pressure sensitivity icon, if you are using a Graphics Tablet.
- Use Unified Radius
Use the same brush Radius across all brushes.
- Strength
Controls how much each application of the brush affects the UVs. You can change the brush strength interactively by pressing Shift-F in the 3D Viewport and then moving the brush and then LMB. You can enter the size numerically also while in Shift-F sizing.
- Use Unified Strength
Use the same brush Strength across all brushes.
- Relaxation Method
There are two relax algorithms:
Laplacian, HC
Bemerkung
All brushes use the Airbrush Stroke Method; they continue to act as long as you keep LMB pressed.
Falloff¶
The Falloff allows you to control the Strength falloff of the brush. See Painting Falloff for more information.
Options¶
Reference
- Mode
Edit Mode
- Panel
When UV sculpting is activated, the Sidebar shows the brush tool selection and options.
- Lock Borders
Locks the boundary of UV islands from being affected by the brush. This is very useful to preserve the shape of UV islands.
- Sculpt All Islands
To edit all islands and not only the island nearest to the brush center when the sculpt stroke was started.
- Display Cursor
Hides the sculpt cursor.